For purchase of this item, please read the instructions
Volume 2: Pages 223-227, 1991
Filamentation in High-β Plasmas and Flux Penetration in Type II Semiconductors
Linda Vahala1 and George Vahala2
1Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, Virginia 23508, U.S.A.
2Department of Physics, College of William and Mary, Williamsburg, Virginia 23185, U.S.A.
A detailed analysis is presented between flux penetration in two dimensional type II semiconducting films and experimental observations on the flux penetration in the current sheath of the plasma focus: bound vortex-antivortex pairs, pinning, collapse and magnetic flux rope structure in the vortices.
Keywords: flux penetration, bound vortex pairs, plasma focus, magnetic flux rope structure
Received: March 23, 1990; Final version received: December 15, 2008